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Laser Reactive Deposition (LRD™)
In NanoGram’s Laser Reactive Deposition (LRD™) process, particles synthesized by the same method as NPM™ process are directly deposited onto a platen or substrate. Deposition occurs by a combination of inertial, thermophoretic, and/or electrophoretic forces. Heat generated from the exothermic combustion and particle formation processes are transferred to the particles.
Click on the image above for LRD Process Animation.
The uniformity of the laser reaction zone generates a highly uniform particle stream, which leads to highly uniform deposition. The LRD process has achieved very high quality deposition of optical doped-SiO2 glass film; in terms of defect count, purity, composition uniformity, thickness uniformity, and low stress.
Because of precursor flexibility, the LRD process is capable of creating a wide range of complex film compositions. In addition, the modularity of laser zone modules enables sequential multi-layer depositions.
The LRD is capable of single-pass depositions of up to 30µm thickness. Precise reaction conditions enable a high degree of porosity control.
The LRD technology is also capable of dense film deposition.
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